Fonte: Abstracts. Nome do evento: Spring Meeting on The Materials Research Society. Unidade: FFCLRP
Assunto: TERMOELETRICIDADE
ABNT
BUDAK, S. et al. Effect of MeV Si Ion bombardment on thermoelectric characteristics of sequentially deposited SiO2/AuxSiO2(1-x) nanolayrers. 2006, Anais.. San Francisco: MRS, 2006. . Acesso em: 15 maio 2024.APA
Budak, S., Zheng, B., Muntele, C., Xiao, Z., Muntele, I., Chhay, B., & Zimmerman, R. L. (2006). Effect of MeV Si Ion bombardment on thermoelectric characteristics of sequentially deposited SiO2/AuxSiO2(1-x) nanolayrers. In Abstracts. San Francisco: MRS.NLM
Budak S, Zheng B, Muntele C, Xiao Z, Muntele I, Chhay B, Zimmerman RL. Effect of MeV Si Ion bombardment on thermoelectric characteristics of sequentially deposited SiO2/AuxSiO2(1-x) nanolayrers. Abstracts. 2006 ;[citado 2024 maio 15 ]Vancouver
Budak S, Zheng B, Muntele C, Xiao Z, Muntele I, Chhay B, Zimmerman RL. Effect of MeV Si Ion bombardment on thermoelectric characteristics of sequentially deposited SiO2/AuxSiO2(1-x) nanolayrers. Abstracts. 2006 ;[citado 2024 maio 15 ]